Large-area, polarisation-sensitive plasmonic materials from colloidal lithography
نویسندگان
چکیده
منابع مشابه
Large-area, infrared nanophotonic materials fabricated using interferometric lithography
Interferometric lithography IL is an ideal technique for the parallel fabrication of large-area periodic patterns at nanometer scales. Compared to other lithography techniques, IL has the optics advantage of parallel fabrication over large areas, resulting high efficiency and low cost. By combining IL with self-aligned semiconductor processing and epitaxial techniques, complicated nanoscale str...
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ژورنال
عنوان ژورنال: physica status solidi (RRL) - Rapid Research Letters
سال: 2016
ISSN: 1862-6254
DOI: 10.1002/pssr.201600020